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Tegal Launches ICP For MEMS Applications

Wednesday, July 29, 2009 5:01:00 AM PDT | VentureDeal Staff

Petaluma, California  --  MEMS and IC production solution company Tegal Corp. (NASDAQ: TGAL) announced the launch of a new reactor for its wafer processing products.

Called ProNova, it represents the company's third high density inductively coupled plasma (ICP) reactor for its DRIE series wafer processing product line.

“The attention right now in MEMS production and 3D IC packaging is squarely on 200mm applications,” said Paul Werbaneth, Vice President of Marketing and Applications at Tegal. “ProNova, our third generation DRIE ICP source, offers significant advantages over standard ICP sources on larger diameter wafers, with the end results being better productivity and higher yields on 200mm wafers for MEMS and 3D IC customers.”

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